Hikaru Kobayashi
Osaka University, Japan
Title: High efficiency crystalline Si solar cells with simple structure fabricated with surface structure chemical transfer method
Biography
Biography: Hikaru Kobayashi
Abstract
We have developed a method to fabricate ultralow reflectance (≤3%) Si using the surface structure chemical transfer (SSCT) method which simply involves contact of Pt catalyst with Si wafers immersed in H2O2+HF solutions. The SSCT treatment forms a nanocrystalline Si layer with the porosity decreasing with the depth and thus with the refractive index increasing with the depth. Although the graded refractive index can achieve ultralow reflectance, the nanocrystalline Si layer possesses an extremely large surface area, resulting in a high surface recombination rate. We have developed a surface passivation method called PSG method which includes spin-coating of phosphosilicate glass (PSG) and heat treatment at ~900ºC. The heat treatment melts PSG, resulting in its penetration into nanopores in the nanocrsytalline Si layer, formation of chemical bonds with Si nanocrystals, and thus, elimination of surface states. We have fabricated